Total Ionizing Dose (TID) Effects in Extremely Scaled Ultra-Thin Channel Nanowire (NW) Gate-All-Around (GAA) InGaAs MOSFETs
Summary
Total Ionizing Dose (TID) Effects in Extremely Scaled Ultra-Thin Channel Nanowire (NW) Gate-All-Around (GAA) InGaAs MOSFETs is a scholarly article[1].
Key Facts
Total Ionizing Dose (TID) Effects in Extremely Scaled Ultra-Thin Channel Nanowire (NW) Gate-All-Around (GAA) InGaAs MOSFETs's instance of is recorded as scholarly article[2].
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APA4ort.xyz Knowledge Graph. (2026). Total Ionizing Dose (TID) Effects in Extremely Scaled Ultra-Thin Channel Nanowire (NW) Gate-All-Around (GAA) InGaAs MOSFETs. Retrieved May 24, 2026, from https://4ort.xyz/entity/total-ionizing-dose-tid-effects-in-extremely-scaled-ultra-thin-channel-nanowire-nw-gate-all-around-gaa-ingaas-mosfets