Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering

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Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering

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Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering is a scholarly article[1].

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APA 4ort.xyz Knowledge Graph. (2026). Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering. Retrieved May 24, 2026, from https://4ort.xyz/entity/plasma-characteristics-and-properties-of-cu-films-prepared-by-high-power-pulsed-magnetron-sputtering
MLA “Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/plasma-characteristics-and-properties-of-cu-films-prepared-by-high-power-pulsed-magnetron-sputtering.
BibTeX @misc{4ortxyz_plasma-characteristics-and-properties-of-cu-films-prepared-by-high-power-pulsed-magnetron-sputtering_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering}}, year = {2026}, url = {https://4ort.xyz/entity/plasma-characteristics-and-properties-of-cu-films-prepared-by-high-power-pulsed-magnetron-sputtering}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Plasma characteristics and properties of Cu films prepared by high power pulsed magnetron sputtering — https://4ort.xyz/entity/plasma-characteristics-and-properties-of-cu-films-prepared-by-high-power-pulsed-magnetron-sputtering (retrieved 2026-05-24)

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