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Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors
Research article (Nanoscale, 2020) · cited 21× · AI/ML
Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors
Summary
Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors is a scholarly article[1].
Key Facts
Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors's instance of is recorded as scholarly article[2].
References
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APA4ort.xyz Knowledge Graph. (2026). Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors. Retrieved May 24, 2026, from https://4ort.xyz/entity/photolithography-in-the-vacuum-ultraviolet-172-nm-with-sub-400-nm-resolution-photoablative-patterning-of-nanostructures-
MLA“Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/photolithography-in-the-vacuum-ultraviolet-172-nm-with-sub-400-nm-resolution-photoablative-patterning-of-nanostructures-.
BibTeX@misc{4ortxyz_photolithography-in-the-vacuum-ultraviolet-172-nm-with-sub-400-nm-resolution-photoablative-patterning-of-nanostructures-_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors}}, year = {2026}, url = {https://4ort.xyz/entity/photolithography-in-the-vacuum-ultraviolet-172-nm-with-sub-400-nm-resolution-photoablative-patterning-of-nanostructures-}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors — https://4ort.xyz/entity/photolithography-in-the-vacuum-ultraviolet-172-nm-with-sub-400-nm-resolution-photoablative-patterning-of-nanostructures- (retrieved 2026-05-24)
