Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process
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Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process
Summary
Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process is a doctoral thesis[1].
Key Facts
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process authored Chin Wai Lim[2].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's instance of is recorded as doctoral thesis[3].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's publisher is recorded as UC Research Repository[4].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's DOI is recorded as 10.26021/1654[5].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's language of work or name is recorded as English[6].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's country of origin is recorded as New Zealand[7].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's publication date is recorded as +2012-00-00T00:00:00Z[8].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's main subject is recorded as computational fluid dynamics[9].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's work available at URL is recorded as https://ir.canterbury.ac.nz/handle/10092/6829[10].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's Handle ID is recorded as 10092/6829[11].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's title is recorded as Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process[12].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's copyright holder is recorded as Chin Wai Lim[13].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's thesis submitted to is recorded as University of Canterbury[14].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's on focus list of Wikimedia project is recorded as NZThesisProject[15].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's copyright status is recorded as copyrighted[16].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's copyright status is recorded as copyrighted[17].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's online access status is recorded as open access[18].
- Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's thesis committee member is recorded as Mark C Jermy[19].
Body
Designation and Status
Numerical Modelling of Transient and Droplet Transport for Pulsed Pressure - Chemical Vapour Deposition (PP-CVD) Process's instance of is recorded as doctoral thesis[3].