extreme ultraviolet lithography

a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.
Thing next_generation_lithography Q371965
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extreme ultraviolet lithography

Summary

extreme ultraviolet lithography is a next-generation lithography[1]. It draws 1,902 Wikipedia views per month (next_generation_lithography category, ranking #1 of 1).[2]

Key Facts

  • extreme ultraviolet lithography's instance of is recorded as next-generation lithography[3].
  • extreme ultraviolet lithography's instance of is recorded as ultraviolet lithography[4].
  • extreme ultraviolet lithography is used for semiconductor device fabrication[5].
  • extreme ultraviolet lithography's Commons category is recorded as Extreme ultraviolet lithography[6].
  • extreme ultraviolet lithography's facet of is recorded as ultraviolet lithography[7].
  • extreme ultraviolet lithography's short name is recorded as {'lang': 'en', 'text': 'EUV'}[8].
  • extreme ultraviolet lithography's P14541 is recorded as 1LcGWf[9].

Body

Definition and Type

Recorded instance of include next-generation lithography[3] and ultraviolet lithography[4].

Use and Application

extreme ultraviolet lithography is used for semiconductor device fabrication[5].

Why It Matters

extreme ultraviolet lithography draws 1,902 Wikipedia views per month (next_generation_lithography category, ranking #1 of 1).[2] It has Wikipedia articles in 15 language editions, a strong signal of global cultural recognition.[10] It is known by 32 alternative names across languages and contexts.[11]

References

Programmatic citations — every numbered marker resolves to a verifiable graph row below.

Direct Wikidata claims

  1. [3] ↑ . wikidata.org.
  2. [4] ↑ . wikidata.org.
  3. [5] ↑ . wikidata.org.
  4. [6] ↑ . wikidata.org.
  5. [7] ↑ . wikidata.org.
  6. [8] ↑ . wikidata.org.
  7. [9] ↑ . wikidata.org.

Class ancestry

  1. [1] ↑ . Wikidata. wikidata.org.

Aggregate / graph-position facts

  1. [2] ↑ . Wikimedia Foundation. dumps.wikimedia.org.
  2. [10] ↑ . Wikidata sitelinks. wikidata.org.
  3. [11] ↑ . Wikidata aliases. wikidata.org.

📑 Cite this page

Use these citations when quoting this entity in research, articles, AI prompts, or wherever provenance matters. We aggregate Wikidata + Wikipedia + authoritative open-data sources; the stitched, scored, cross-referenced view is what 4ort.xyz contributes.

APA 4ort.xyz Knowledge Graph. (2026). extreme ultraviolet lithography. Retrieved October 5, 2026, from https://4ort.xyz/entity/extreme-ultraviolet-lithography
MLA “extreme ultraviolet lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 5 Oct. 2026, https://4ort.xyz/entity/extreme-ultraviolet-lithography.
BibTeX @misc{4ortxyz_extreme-ultraviolet-lithography_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{extreme ultraviolet lithography}}, year = {2026}, url = {https://4ort.xyz/entity/extreme-ultraviolet-lithography}, note = {Accessed: 2026-10-05}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): extreme ultraviolet lithography — https://4ort.xyz/entity/extreme-ultraviolet-lithography (retrieved 2026-10-05)

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Edit History

Rolling log of changes to this entity's Wikidata record. Values shown reflect the current state of each edited property — follow the history link to see the precise diff for any edit.

  1. 6d ago · Ottawajin · 2026-09-29 view diff on Wikidata ↗
    Sitelink count → 21
    J-global id → 201006098537932420
    Wikipedia title → EUV lithography
    Wikipedia languages → ['ar', 'ca', 'commons', 'de', 'en', 'es', 'eu', 'fa', 'fr', 'id', 'it', 'ja', 'k
    + 1 other property edited (see Wikidata diff for full list)
    "/* wbsetclaim-create:1||1 */ [[Property:P7783]]: 201006098537932420, Matched to [[:toollabs:mix-n-match/#/entry/262117013|extreme ultraviolet lithography (#262117013)]] in [[:toollabs:mix-n-match/#/ca"
  2. 12w ago · Nyuhn · 2026-07-10 view diff on Wikidata ↗
    Instance of → next-generation lithography, ultraviolet lithography
    Has use → semiconductor device fabrication
    P14541 → 1LcGWf
    Facet of → ultraviolet lithography
    + 2 other properties edited (see Wikidata diff for full list)
    "/* wbeditentity-update:0| */ QuickStatements 3.0 [[:toollabs:qs-dev/batch/40849|batch #40849]]: ZGBK ID"
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